Spin Coater ERK-AS
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작성자이알케이 댓글 0건 조회 244회 작성일 23-02-02 14:06본문
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Auto Spin Coating System
(ERK-AS Series)
반도체, 디스플레이 Photo 공정에서 Wafer or Glass에 Photo Resist를
코팅하고 현상하며 Bake하기 위한 시스템으로 Cassette내 기판을 Robot으로
이송하는 Full Auto System임.
▪ 다양한 Unit 구성
- Spin Coater, Developer, HP, CP
- Cassette Stage, Centering Unit
▪ 정밀 Wafer Transfer Robot 채용(Dual Finger)
▪ 안정되고 검증된 Scheduler 적용
User Friendly Interface & Display
Wafer Transfer Robot
+ High performance wafer transfer
+ Ceramic dual finger
+ Wafer mapping sensor
Spin Unit
+ Coater, Developer.
+ 2 Chemical dispense arm
+ Auto chemical dispense
+ Spin motor : AC Servo motor
+ Spin chuck , Cup
Bake Unit
+ Hot Plate, Cool Plate
+ Proximity ball plate
+ Lift Pin Up/Down
+ PID temp control method
System Specification
ITEM | ERK-AS 150 | ERK-AS 200 | ERK-AS 300 |
Wafer Size | 4” ~ 6” | 6” ~ 8” | 12” |
Cassette Stage | Uni-cassette 2 unit (25 slot) | ||
Spin units | Max 3 units [ Coater, Developer ] | ||
Bake units | Max 9 units [ Adhesion, Hot plate, Cool plate ] | ||
Spin Motor | AC Servo Motor, Max ~ 5000rpm, | Max 3,000rpm | |
Wafer transfer | Magnetic-shield-type clean dual finger robot | ||
Coater dispense | PR (Max 3 nozzle), EBR, BSR | ||
Developer dispense | DEV (Max 2 Nozzle), Top Rinse, BSR | ||
Operation Panel | 15 “ Touch Monitor | ||
Option | Chemical temp controller, T & H Controller, FFU | ||
Spin Cleaning System (300mm wafer)
Spin Cleaning System
+ 용도 : Develop, Cleaning, Etching
+ Substrate Size
= 300mm wafer
+ Spin Motor
= Motor : AC Servo, Max 3000rpm
+ Load Port, Clean Robot System
+ Unit : Centering, Etching, Developer, Cleaning, Bake Unit
+ Chemical dispense
= Manual or Auto
= Nozzle : Stream, Spray, Jet Etc
+ Chemical Auto Supply Module
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